Molecular dynamics simulations of deposition in Ni-Al system

В. М. Безпальчук

Abstract


The paper presents a numeric model of the deposition by means of molecular dynamics simulations, using embedded-atom method (EAM) type potential. Simulation for Ni deposition on Al substrate was investigated in this work. The state dependence of the contact zones of Ni and Al on the deposition conditions (temperature, flux density) are found.


Keywords


molecular dynamics; Ni-Al system; deposition; solid solution; nanometric metallic layer; еmbedded atom model; radial distribution function

References


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